Stitch-avoiding Global Routing for Multiple E-Beam Lithography

Document Type

Conference Article

Publication Title

Proceedings - 2022 35th International Conference on VLSI Design, VLSID 2022 - held concurrently with 2022 21st International Conference on Embedded Systems, ES 2022

Abstract

In Multiple E-Beam Lithography (MEBL), a layout of an IC is partitioned into vertical stripes whose boundaries are called stitch-lines. Routing patterns in each stripe are written by different beams and/or in different writing passes. However, patterns cut by stitch-lines suffer from overlay errors resulting in severe pattern distortions. These distortions are mainly due to Via violation, Vertical Routing violation, or Short Polygon. In this paper, we have proposed a Stitch-avoiding Global Router. The proposed method selects the best possible global routing path for each net so that even a traditional detailed router can generate a Detailed Routing solution with fewer violations. Experimental results show that our proposed global router followed by a conventional detailed router generates solutions with 17.3%, 6.21% and 1.89% reduction in Via violations, Short polygon violations and routed wirelength respectively with no vertical routing violations, compared to those by traditional global routing.

First Page

138

Last Page

143

DOI

10.1109/VLSID2022.2022.00037

Publication Date

1-1-2022

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